Atomic layer deposition of CeO2 using a heteroleptic cyclopentadienyl-amidinate precursor
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چکیده
منابع مشابه
Atomic Layer Deposition of Ultrathin Copper Metal Films from a Liquid Copper(I) Amidinate Precursor
We report a method for producing thin, completely continuous and highly conductive copper films conformally inside very narrow holes with aspect ratios over 35:1 by atomic layer deposition ALD . Pure copper thin films were grown from a novel copper I amidinate precursor, copper I N,N -di-sec-butylacetamidinate, and molecular hydrogen gas as the reducing agent. This copper precursor is a liquid ...
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ژورنال
عنوان ژورنال: Journal of Vacuum Science & Technology A
سال: 2018
ISSN: 0734-2101,1520-8559
DOI: 10.1116/1.5026405